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URL of this page :
https://www.nwo-i.nl/en/vacature/various-scientific-internships-at-arcnl/

Printed on :
August 17th 2017
19:57:15

Research description
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.

ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. At ARCNL we do exciting fundamental physics and chemistry at the highest possible level with a relevance to key technologies in nanolithography. We wish to contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature.

ARCNL performs research within the following strongly connected themes:

  • EUV Plasma Processes;
  • EUV Generation & Imaging;
  • EUV Photoresist;
  • Nanophotochemistry;
  • EUV Targets;
  • Nanolayers.

ARCNL regularly has vacancies for internships. Check the ARCNL website for an overview of the available internships or contact ARCNL group leaders individually.

Location
ARCNL is located at the Amsterdam Science Park, the Netherlands, and aims to engage approximately 100 scientists and support staff. See www.arcnl.nl for more information.

Requirements
We are looking forward to your application if you meet the following requirements:

  • you participate in a relevant Bachelor or a Master study;
  • the internship is a mandatory part of your curriculum;
  • you have a nationality of an EU-member state and/or you are a student at a Dutch University.

Further information
For further information see contact information in the advertisement at the ARCNL website.

Application
To apply go to the ARCNL website and use the button 'Apply for this position' at the bottom of the advertisement or contact ARCNL group leaders individually.