NWO-I

Institutes Organisation of NWO

Simple model captures complex plasma behaviour

ARCNL researchers in the Source Department discovered that a relatively simple, universal power law determines the complex behaviour of an expanding plasma of highly charged ions.

AI-generated impression of simple universal model capturing complex plasma behaviour. Credits: ARCNL
AI-generated impression of simple universal model capturing complex plasma behaviour. Credits: ARCNL

Properties of ions from plasma

In a series of experiments, the researchers studied the properties of the ions flying away from the plasma. They varied all the possible parameters in their setup of the experiment. Group leader John Sheil says: “To our great surprise, the average charge state of the detected ions always appeared to scale with their kinetic energy to the power of 0.4. It was an chance discovery,” says Sheil. “And it took us years and endless discussions to explain it.”

Computer chip machines

ASML’s most advanced computer chip machines use plasma to generate extreme ultraviolet (EUV) light. Knowledge about the properties of the fast-moving plasma ions contributes to the proper functioning of the computer chip machine.

ARCNL building at Amsterdam Science Park
ARCNL building at Amsterdam Science Park

More information

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